Novel Laser-Driven Microplasma Extreme Ultraviolet Source

A novel extreme ultraviolet (EUV) system provides a power efficient and cost effective solution for nanoscale imaging applications.

A novel extreme ultraviolet (EUV) system provides a power-efficient and
cost-effective solution for nanoscale imaging applications.

Abstract:

The EUV market will see continued growth in the coming years owing to its increasing applications in nanoscale imaging in the semiconductor industry, attosecond pulse generation for research, and photoemission spectroscopy. The EUV market is predicted to grow at a CAGR of 9.2% up to 2025. However, many of these currently known EUV systems suffer from problems such as slow image processing times, low output power, and are expensive, bulky, and dangerous. Here we present an ideal EUV source developed by a group of researchers led by Prof. Keshav Dani, that has high power efficiency and overcomes these problems.

This technology is a laser-driven extreme EUV radiation source. By guiding a low pulse energy femtosecond laser beam on a gas target in a novel way, one can generate a microplasma used as a wavelength converter to generate EUV radiation. This technology provides a power-efficient EUV generation and fast image processing speed. The low power requirement provides compatibility with widely spread, compact and cheaper low-power femtosecond lasers. Additionally, proof of concept research is ongoing and focuses on industrial applications in the semiconductor industry

Applications:

EUV nanoscale imaging
Attosecond pulse generation
Photoemission spectroscopy
Advantages
Power-efficient EUV generation
Fast imaging processing times
Cheap and compact

Website:

https://groups.oist.jp/tdic/technology0158