High throughput scaling of the production and characterization of graphene represents a significant requirement to exploit the exceptional electrical, optical, and mechanical properties of graphene. The layer thickness and uniformity of the graphene are important parameters that affect the performance and properties of the sample. Raman microscopy, Atomic Force microscopy, or color contrast methods are typically used to characterize graphene. Microscopic methods are slow and are limited to smaller regions. Color contrast methods typically require frequent calibration and are dependent on the substrate. Fluorescence Quenching Microscopy (FQM) is a promising method that is fast, substrate independent and equipment is widely available.
Prof. Cengiz Ozkan and his research team at UCR have a patented invention that advances the capabilities of FQM – in identifying and counting large-scale graphene layers.
The significance of this discovery is:
- High throughput method for counting and measuring the uniformity of graphene layers.
- Does not require additional calibration.
- Allows for full automation.
- Can be applied to layers in a large area and is substrate agnostic.
- Consistent, repeatable and flexible technique.
- Energy storage including rechargeable lithium batteries and supercapacitors.
- Photovoltaics or solar cells.
- Semiconductor devices.
- Thermal heat sinks
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